Solution processed simple and scalable graphene patterning method for nanodevices application

Yadav, Shriniwas and Kaur, Inderpreet (2016) Solution processed simple and scalable graphene patterning method for nanodevices application. Materials Research Express, 3 (2). p. 125011. ISSN 2053-1591

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Official URL: http://iopscience.iop.org/article/10.1088/2053-159...

Abstract

We have reported a simple, scalable and solution processed graphene patterning method using electron beam lithography followed by a lift-off process. This method is free from etching process and can be used for fabrication of graphene based patterns for nanodevices application. This process is universal to arbitrary substrates and can be employed for large scale pattern fabrication especially for graphene array based nanodevice applications. Using this method various types of graphene patterns like rectangular lines (100 μm × 10 μm) connecting with square pads (50 μm × 50 μm) and hall probe patterns were created over oxidized silicon substrates.

Item Type: Article
Subjects: CSIO > Nano Science and Nano Technology
Divisions: Nano Science and Nano Technology
Depositing User: Ms. Jyotsana
Date Deposited: 09 Aug 2018 11:53
Last Modified: 09 Aug 2018 11:53
URI: http://csioir.csio.res.in/id/eprint/708

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